jerryh100@lemmy.world to Technology@lemmy.worldEnglish · 4 months agoIntel is the latest Fortune 500 giant to test the ‘4 wrong CEOs’ rulefortune.comexternal-linkmessage-square24fedilinkarrow-up11arrow-down10file-text
arrow-up11arrow-down1external-linkIntel is the latest Fortune 500 giant to test the ‘4 wrong CEOs’ rulefortune.comjerryh100@lemmy.world to Technology@lemmy.worldEnglish · 4 months agomessage-square24fedilinkfile-text
minus-squareNighed@sffa.communitylinkfedilinkEnglisharrow-up0·4 months agoThe money was to build fabs, which they are still doing - which is costing them most of money they struggle to afford because their current chips are awful. Their fabs may be shit too. Hopefully the new ones are better
minus-squarehuginn@feddit.itlinkfedilinkEnglisharrow-up0·4 months agoI mean how bad can the fabs be - they’ll be running ASML EUV machines right?
minus-squarehagelslager@feddit.nllinkfedilinkEnglisharrow-up0·4 months agoI’m not sure the tool is the the issue here? A master carpenter with entry level tools will still do a much better job than a klutz with professional grade tools.
minus-squareNighed@sffa.communitylinkfedilinkEnglisharrow-up0·4 months agoThey went through a phase where they were getting awful yields. No idea why they had those problems and others didn’t.
minus-squareQwaffle_waffle@sh.itjust.workslinkfedilinkEnglisharrow-up0·4 months agohttps://www.datacenterdynamics.com/en/news/intel-completes-assembly-of-high-na-euv-lithography-tool-at-oregon-fab/
The money was to build fabs, which they are still doing - which is costing them most of money they struggle to afford because their current chips are awful.
Their fabs may be shit too. Hopefully the new ones are better
I mean how bad can the fabs be - they’ll be running ASML EUV machines right?
I’m not sure the tool is the the issue here?
A master carpenter with entry level tools will still do a much better job than a klutz with professional grade tools.
They went through a phase where they were getting awful yields. No idea why they had those problems and others didn’t.
https://www.datacenterdynamics.com/en/news/intel-completes-assembly-of-high-na-euv-lithography-tool-at-oregon-fab/